Essential details
Shipping:Land transport, Sea transport
Product Introduction
Main product: Rotating silicon target material
It is a tubular target material suitable for magnetron sputtering equipment, with high-purity silicon (purity typically ≥99.9999%) as the core raw material. It is mechanically processed into a tube and then bonded with a titanium backing tube to form a single unit. It is primarily used in physical vapor deposition (PVD) processes such as the preparation of flat display panels, optical lenses, and the deposition of thin films for photovoltaic cells
Advantages: ① High purity, Si≥99.9999%
② The target material is integrated without splicing, and the length of the target material can reach up to 2 meters.
③ Suitable for high power, high thermal conductivity, long-term sputtering, with low particle defects.
It is a tubular target material suitable for magnetron sputtering equipment, with high-purity silicon (purity typically ≥99.9999%) as the core raw material. It is mechanically processed into a tube and then bonded with a titanium backing tube to form a single unit. It is primarily used in physical vapor deposition (PVD) processes such as the preparation of flat display panels, optical lenses, and the deposition of thin films for photovoltaic cells
Advantages: ① High purity, Si≥99.9999%
② The target material is integrated without splicing, and the length of the target material can reach up to 2 meters.
③ Suitable for high power, high thermal conductivity, long-term sputtering, with low particle defects.
