The monocrystalline silicon focusing ring is a core component of a plasma processing device, primarily used in the field of semiconductor manufacturing. It enhances etching uniformity and reduces backside deposition by surrounding the periphery of the wafer.
Advantages: ① Monocrystalline structure has fewer defects, higher mechanical strength, and superior plasma bombardment resistance compared to polycrystalline materials
② The surface finish can reach the nanometer level, preventing particle shedding and contamination of the wafer
③ High matching degree between thermal expansion coefficient and wafer, making it less prone to deformation under high-temperature processes